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    Tantalum Sputtering Target - Rectangular
    Standard：
    ASTM B708
    Grade：
    RO5200, Ta 99.95%-99.99%
    Size：
    Rectangular Target

    Introduction：

    Tantalum Sputtering Target , Rectangular Target , Ta 99.95%-99.99% 3N5-4N Purity, Coating Material


    Application: Coating materials for semiconductors and optics, packages

    Purity: 99.95%-99.99%

    Impurities: ppm max by weight


    Element Al Ag Au B Bi Ca Cd Cl Co Cr Cu Fe
    Content 0.2 1.0 1.0 0.1 1.0 0.1 1.0 1.0 0.05 0.25 0.75 0.4
    Element Ga Ge Hf K Li Mg Mn Mo Na Nb Ni P
    Content 1.0 1.0 1.0 0.05 0.1 0.1 0.1 5.0 0.1 75 0.25 1.0
    Element Pb S Si Sn Th Ti V W Zn Zr Y U
    Content 1.0 0.2 0.2 0.1 0.0 1.0 0.2 70.0 1.0 0.2 1.0 0.005


    Non-Metallic impurities, ppm max by weight

    Element C H O N
    Content 100 15 150 100


    Grain Size: <100μm (Other grain size available upon request)

    Flatness ≤0.2mm

    Surface Roughness<1.6μm

    Description:

    Tantalum is featured the third highest melting point 2996℃ and high boiling point 5425℃. It has the characteristics of high temperature resistance, high corrosion resistance, cold machining and good welding performance. Therefore, tantalum is widely used in electronics, semiconductor, chemical, engineering, aviation, aerospace, medical, military industry etc. The application of tantalum will be more and more widely used in more industry with the technology progress and innovation. It can be found in cell phones, laptops, game systems, automotive electronics, light bulbs, satellite components and MRI machines.


    Tantalum sputtering target is mainly applied in semiconductor industry and optical coating industry. We manufacture various specifications of tantalum sputtering targets upon the request of customers. Through vacuum EB furnace smelting method, we get high purity tantalulm ingots with minimum 99.95% Ta content. By wary of unique rolling process, through complicated treatment and accurate annealing temperature and time, we produce different dimensions of the tantalum rectangular sputtering targets. Moreover, we guarantee the grain size is below 100um, flatness is below 0.2mm and the Surface Roughness is below Ra.1.6μm.

    The size can be tailored by the customers’ requirements. We control our products quality through the raw material source till the whole production line and finally deliver to our customers in order to make sure you purchase our products with stable and same quality each lot.


    If you require customization service, you only need to send us your required material, purity, dimension, quantity or a drawing for an inquiry. We will reply you our best quote ASAP.