Application: mainly applied in semiconductor industry and optical coating industry

Purity:Ta 99.95%-99.99% 3N5-4N

Grain Size:Typical size<100μm Other grain size available upon request

Flatness ≤0.2mm

Surface Roughness<1.6μm

Impurities:

Metallic impurities, ppm max by weight

Element	Au	Ag	Al	B	Bi	Cd	Ca	Cl	Cr	Co	Cu	Fe
Content	1.0	1.0	0.2	0.1	1.0	1.0	0.1	1.0	0.25	0.05	0.75	0.4
Element	Ge	Ga	Li	K	Hf	Mg	Mn	Mo	Na	Nb	Ni	P
Content	1.0	1.0	0.1	0.05	1.0	0.1	0.1	5.0	0.1	75	0.25	1.0
Element	Pb	S	Si	Sn	Th	Ti	V	W	Zn	Zr	Y	U
Content	1.0	0.2	0.2	0.1	0.0	1.0	0.2	70.0	1.0	0.2	1.0	0.005

Non-Metallic impurities, ppm max by weight

Element	C	H	O	N
Content	100	15	150	100

Description:

Tantalum is dense, ductile, very hard, easily fabricated, and highly conductive of heat and electricity and is featured the third highest melting point 2996℃ and high boiling point 5425℃. It has the characteristics of high temperature resistance, high corrosion resistance, cold machining and good welding performance. Therefore, tantalum and its alloy are widely used in electronics, semiconductor, chemical, engineering, aviation, aerospace, medical, military industry etc. The application of tantalum will be more and more widely used in more industry with the technology progress and innovation. It can be found in cell phones, laptops, game systems, automotive electronics, light bulbs, satellite components and MRI machines.

Tantalum sputtering target is usually applied in optical coating industry and semiconductor industry. Various specifications of tantalum sputtering targets can be manufactured upon the request of customers's needs through tantalum ingots smeltered by vacuum EB furnace smelting method. By way of unique rolling process, through complicated treatment and accurate annealing temperature and time, we produce different shapes of the tantalum sputtering targets such as disc targets, rectangular targets and rotary targets. Moreover, we guarantee the minimum tantalum purity is 99.95% and higher; the grain size is below 100um, flatness is below 0.2mm and the Surface Roughness is below Ra.1.6μm. The dimensions can be tailored by the customers’ requirements.

We are trying our best to innovate our techniques, enhance the product quality, increase the product utilization rate, lower down the costs, improve our service to supply our customers’ with higher quality products but lower purchase costs. Once you choose us, you will obtain our stable high quality products, more competitive price than other suppliers and our timely, high efficient services.

We control our products quality through the raw material source till the whole production line and finally deliver to our customers in order to make sure you purchase our products with stable and same quality each lot.

Furthermore, we are glad to provide you the trade in service. We can recover your used sputtering targets to help you with supplying a same new one with lowest price. You are warmly welcome to tell your ideas or requirements to us in a win-win prospect. For more inquiry and information, please don’t hesitate to contact us at any time. We also expect your visit to our factory to witness our whole infrastructure, technology, products and our team.